Silikon nitrida: Perbedaan antara revisi
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Film silikon nitrida kelas elektronik dibentuk dengan menggunakan [[deposisi uap kimia]] (''chemical vapor deposition'', CVD), atau salah satu variannya, seperti ''[[Plasma-enhanced chemical vapor deposition]]'' (PECVD):<ref name=hist/><ref name=prop/>
:<chem>{3SiH4_(g)} + 4NH3_(g) -> {Si3N4_(s)} + {12H2_(g)}\ \mathit{pada}\ \mathit{750-850^oC}</chem><ref name="Morgan&Board">{{cite book|last1=Morgan|first1=D. V.|last2=Board|first2=K.|title=An Introduction To Semiconductor Microtechnology|url=https://archive.org/details/introductiontose0000morg_x0b5|date=1991|publisher=John Wiley & Sons|location=Chichester, West Sussex, England|isbn=0471924784|page=[https://archive.org/details/introductiontose0000morg_x0b5/page/27 27]|edition=2nd|accessdate=14 December 2016}}</ref>
:<chem>{3SiCl4_(g)} + {4NH3_(g)} -> {Si3N4_(s)} + {12HCl_(g)}</chem>
:<chem>{3SiCl2H2_(g)} + {4NH3_(g)} -> {Si3N4_(s)} + {6HCl_(g)} + {6H2_(g)}</chem>
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